Reese Tompkins - Visiting Nancy Elizabeth Prophet, "I Will Not Bend an Inch" Museum Exhibit
When I visited the Nancy Elizabeth Prophet, “I Will Not Bend an Inch” exhibit, two pieces caught my attention—one titled “Discontent” and the other an untitled piece known simply as “Mask.” The piece that stood out to me the most was the untitled “Mask.” What struck me most about the piece was the caption beneath it. The description included a quote that read:
“To wear the mask, concealing one's Blackness and/or Indigeneity, is an act of self-protection that carries risk. The mask may inundate its wearer, making it harder to disentangle from the systems of violence that compel concealment.”
This quote deeply resonated with me because it made me think about how often I put on a “mask” to fit someone else’s narrative. I realized that I code-switch not only around people of different races but also around anyone I feel might not accept me as I truly am. I tone down my emotions, avoid slang, and adjust my expressions—all to make others comfortable. That realization was both powerful and unsettling. This reflection reminded me of a quote from Dick Gregory that we discussed in my ADW class: “You can't expect to grow up in a white racist culture and not acquire a white racist mentality… even when you’re Black.” This connection helped me see the artwork through a sociocultural lens. Black people are often compelled to “wear the mask” of whiteness, rather than proudly loving their Blackness. I was led to think about my identity—it made me question how much of who I am is authentically mine versus what is shaped by external expectations.
Ultimately, viewing the “Mask” has influenced my personal goals by inspiring me to live with greater authenticity and self-acceptance. It reminded me that when we change ourselves to fit someone else’s idea of acceptability, we lose ownership of our own achievements and identity. Overall, this exhibit was a call to action to look at what kind of mask we put on for the rest of the world.
-Reese Tompkins ℅ 2029
“Mask” “Discontent”
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